Photomask Fabrication Technology (Professional Engineering)
| Author | : | |
| Rating | : | 4.79 (515 Votes) |
| Asin | : | 0071445633 |
| Format Type | : | paperback |
| Number of Pages | : | 500 Pages |
| Publish Date | : | 2013-03-18 |
| Language | : | English |
DESCRIPTION:
When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Thus the rapid recent growth of the field and the need for this book. Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs)
Includes detailed coverage of: Data preparation methods and issues Pattern formation and transfer technology Metrology and finishing methods Resolution enhancement applications Next-generation lithography trendsGain the expertise required for modern photomask manufacturing with this definitive resource: Data preparation and design * Pattern generation * Pattern transfer * Photomask metrology * Defect control and finishing * Inspection, repair, and cleaning * Resolution enhancement techniques * Wafer fabrication issues * Future developments . From the Back CoverFabrication processing methods Quality control parameters Resolution enhancement techniques Defect reductionPhotomask fabrication technologies and applications A must-have guide for engineers developi
He has more than 18 years of experience in wafer and photomask industry technology. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. Benjamin G. . He has expert-level photomask fabrication experience in the pattern transfer process
Mask Making Great intro book on photo-mask, development , manufacturing & history. That said, it needs to be updated.